Tosoh Quartz Corporation

Silica Glass

Silica glass is a special kind of glass that is composed almost entirely of SiO2. Compared to other types of glass, which contain other elements, silica glass has very low levels of metallic impurity, ranging from 10 ppm at the most to less than 10 ppb for high-purity grades. It is this extremely high level of purity that provides silica glass with its superb features that cannot be found in other types of glass.

Features of Silica Glass

Silica Glass Material

Our company manufactures products out of silica glass materials manufactured by Tosoh SGM, one of our affiliated companies. We select the material that best matches the quality level and specifications required by our customers. This website introduces our silica glass materials and their various characteristics.
For detailed information about these materials, please visit the TOSOH CORPORATION website.

Lineup of Silica Glass Material

Category Process Grade Features
Fused Silica Glass Oxy-hydrogen flame fusion N Semiconductor standard grade, Less bubbles
NP High-purity grade of N
S High-purity grade with good light transmission
OP-1 Semiconductor standard grade opaque
OP-3 Semiconductor high-purity grade opaque
OP-3HD OP-3 grade with enhanced surface smoothness
Electrically fused HR Semiconductor standard grade, High heat resistance
HRP High-purity grade of HR
Synthetic Silica Glass Oxy-hydrogen flame fusion
(Verneuil type process)
ES Standard optical grade for optics
ESL-1 Standard optical grade with 1D striae free
ESL-1000 Enhanced excimer durability for ESL-1
ESL-2 Good homogeneity with 3D striae free
ESL-2000 Enhanced excimer durability for ESL-2
Oxy-hydrogen flame fusion
(VAD process)
ED-H Good homogeneity with 3D striae free
ED-C Very low OH content (OH content < 1ppm)

Purity

Fused silica glass is manufactured from high-purity silica powder, and synthetic silica glass is manufactured from high-purity SiCl4. Impurity levels for fused silica glass are measured in the ppm region and for synthetic silica glass in the ppb region.

◎Impurity Level of Major Silica Glass Material
Unit: ppm
Variation Grade Al Ca Cu Fe Na K Li Mg OH
Fused Transparent N 8 0.6 <0.01 0.2 0.6 0.1 0.07 0.06 200
NP 7 0.5 <0.01 0.1 0.1 0.04 0.07 0.02 200
S 0.7 <0.01 <0.01 0.05 0.1 <0.01 <0.01 <0.01 160
HR 15 0.6 0.02 0.2 0.8 0.6 0.5 0.1 10
HRP 15 0.6 0.01 0.2 0.2 0.6 0.2 0.1 10
Opaque OP-1 8 0.7 <0.01 0.2 0.6 0.3 0.07 0.06 160
OP-3 8 0.6 <0.01 0.2 0.08 0.1 0.07 0.04 160
OP-3HD 8 0.6 <0.01 0.2 0.08 0.1 0.07 0.04 160
Synthetic Transparent ES*1 <0.01 <0.01 <0.01 <0.01 <0.01 <0.01 <0.01 <0.01 1000
ED-C <0.01 <0.01 <0.01 <0.01 <0.01 <0.01 <0.01 <0.01 <1
ED-H <0.01 <0.01 <0.01 <0.01 <0.01 <0.01 <0.01 <0.01 <100

(Typical values Not guaranteed)

*1: Impurity level of ESL-1, ESL-2, ESL-1000 and ESL-2000 is the same as ES.

Chemical Characteristic

The extreme chemical resistance of silica glass makes it highly suitable as a distillation container for various solvents and acid solutions, and as a dissolution and washing container for various kinds of substances. Attention must be paid when using it for long periods of time, however, because solutions and environments containing hydrofluoric acid, phosphoric acid, alkali, or alkali metal compounds may cause etching and/or surface devitrification.

◎Chemical Reactivity with Acid/Alkaline Solutions
Solution Condition Weight Loss(m2)
Concentration(%) Temperature(℃) Time(Hr)
Alkali NH4OH 10 20 100 0.19
NaOH 1 20 100 0.31
10 20 100 0.095
5 100 10 15
8 100 10 12.1
KOH 1 20 100 0.19
30 100 10 0.27
10 10 100 11.3
Na2CO3 5 20 100 0.015
10 100 10 3.7
Acid H2SO4 98 205 24 0.06
98 20 240 0.016
HNO3 65 115 24 0.11
65 20 240 0.06
HCl 37 66 24 0.14
37 20 240 0.18

(Typical values Not guaranteed)

◎Chemical Reactivity with Other Materials
Metal Al, Mg Rapid reaction at 700-800℃
Au, Ag, Pt No reaction
Zn, Sn, Pb No reaction
Si Slight reaction when fused
Ge No reaction at 900℃
Mo, W No reaction
Oxide Al2O3 Gradual reaction over 900℃
CaO Reaction over 900℃
CuO Reaction over 800℃
Fe2O3 Reaction over 900℃
PbO Intense reaction when fused
MgO Slight reaction at 900℃
ZnO Reaction over 420℃
Gas CO, SO2 No reaction
N2, O2 No reaction
Cl2 No reaction
F2 No reaction with dried gases under 300℃
H2 No reaction
HCl No reaction
Salt BaCl2 Reaction when fused
BaSO4 Reaction over 700℃
CaCl2 Slight reaction when fused at 800℃
KCl Acceleration of devitrification at high temp.
KF Intense reaction when fused
NaCl Reaction visually recognized over 800℃
Na2SO4 No reaction

Optical Characteristics

We have lineups of ES series and ED series optical materials. Both are synthetic silica glass materials made from high-purity SiCl4. They have almost no impurities, bubbles, or foreign materials, and have excellent optical transparency in a wide range of wavelengths across the spectrum from vacuum ultraviolet to infrared.

◎Optical Properties of Major Optical Grade Silica Glass Material
Grade Striae*1 Homogeneity*2
Δn(x10-6)within clear aperture
Strain
(nm/cm)
Excimer Durability Applicable Wavelength*3
(nm)
ES N/A N/A 1~20 N/A 180~2,100
ESL-1 1D 3~10(CA:φ300mm) 1~10 N/A 180~2,100
ESL-1000 1D 3~10(CA:φ300mm) 1~10 Negotiable*4 180~2,100
ESL-2 3D <10(CA:φ300mm) 1~10 N/A 180~2,100
ESL-2000 3D <10(CA:φ300mm) 1~10 Negotiable*4 180~2,100
ED-H 3D 5~10(CA:φ180mm) 1~10 N/A 170~2,600
ED-C N/A N/A 1~10 N/A 180~3,400

(Typical values Not guaranteed)

*1: Striae specification is defined as following. 1D: 1 direction free 3D: 3 direction free

*2: Homogeneity means refractive index homogeneity and is expressed as Δn(PV) within effective area.
For questions regarding materials with greater homogeneity, non-standard sizes and guaranteed values
please contact us separately.

*3: Applicable wavelength is defined as the wavelength range where external transmittance is more than 80%/cm.

*4: Excimer durability is specified with Tosoh SGM’s KrF and ArF excimer laser damage tests.

◎Spectral Transmission of Major Optical Grade Silica Glass Material

Mechanical, Thermal and Electrical Characteristics

Silica glass has unique properties that cannot be found in other materials. For example, silica glass’s rigidity, pulling strength, bending strength, etc. increase with a rise in temperature, culminating at around 800°C to 1,000°C before suddenly decreasing at temperatures that exceed those levels.

◎Physical Properties of Major Silica Glass Material
Item Unit ES*1 ED-C ED-H N, NP HR, HRP S OP-1,3 OP-3HD
Mechanical Density cm3 2.2 2.2 2.2 2.2 2.2 2.2 2.02 2.1
Young’s modulus GPa 74 74 74 74 74 74
Shear modulus GPa 31 31 31 31 31 31
Poisson’s ratio   0.18 0.18 0.18 0.17 0.17 0.17
Bending strength*2 MPa 94.3 94.3 94.3 94.3 94.3 94.3 60 67
Compressive strength MPa 1,128 1,128 1,128 1,128 1,128 1,128
Tensile strength*2 MPa 49 49 49 49 49 49
Torsion strength MPa 29 29 29 29 29 29
Vickers hardness MPa 8,900 8,900 8,900 8,900 8,900 8,900 8,900 8,900
Thermal Strain point
(η=1014.5)
970 970 1,060 1,070 1,120 1,060 1,050 1,050
Annealing point
(η=1013)
1,080 1,080 1,170 1,180 1,220 1,165 1,170 1,170
Softening point
(η=107.6)*3
(1,720) (1,720) (1,720) (1,720) (1,720) (1,720) (1,720) (1,720)
Coefficient of thermal expansion
30~600℃
x10-7/ ℃ 4.7 4.7 4.7 5.9 5.9 5.9 6.9 6.9
Specific heat
20℃
J / kg・K 749 749 749 749 749 749 749 749
Thermal diffusivity
20℃
x10-7m2/ s 8.5 8.5 8.5 8.3 8.3 8.3 8.4 8.5
Thermal conductivity
20℃
W / mK 1.38 1.38 1.38 1.38 1.38 1.38 1.24 1.33
Viscosity
(logη)1200℃
Poise 10.60 10.60 11.37 11.72 12.18 12.10 11.72 11.72
Electrical Dielectric constant
500MHz
  3.9 3.9 3.9 3.9 3.9 3.9 3.7 3.8
Dielectric loss
500MHz
x10-3 <1 <1 <1 <1 <1 <1 <1 <1
Resistivity Ω 5×1015 5×1015 5×1015 3×1015 8×1015 4×1015
Volume resistivity Ω・cm 1x1017 1x1017 1x1017 5x1016 1x1017 7x1016

(Typical values Not guaranteed)

*1: Properties of ESL-1, ESL-2, ESL-1000 and ESL-2000 are the same as ES.

*2: Bending and Tensile strengths are affected by surface conditions.

*3: Estimate from extrapolation.

NOTE: Unless otherwise stated, all values represent typical data at 25℃